Titano taikinys

Grynumas
Purity is one of the main performance indicators of the target, because the purity of the target has a great influence on the performance of the film. However, in practical applications, the purity requirements for the target are not the same. For example, with the rapid development of the microelectronics industry, the silicon chip size has been developed from 6", 8" to 12", while the wiring width has been reduced from 0 . 5um iki 0 . 25um, 0,18um ar net 0,13um, o ankstesnis 99,995% tikslinė grynumas gali atitikti 0,35uminio proceso reikalavimus, kad būtų galima paruošti 0,18um linijas 99,999% arba net 99,99999%.
Priemaišų turinys
Impurities in target solids and oxygen and water vapor in pores are the main pollution sources of deposited films. Targets for different purposes have different requirements for different impurity content. For example, pure aluminum and aluminum alloy targets used in the semiconductor industry have special requirements for alkali metal content and radioactive element content.
Tankis
In order to reduce the porosity in the target solid and improve the performance of the sputtered film, the target is usually required to have a high density. The density of the target not only affects the sputtering rate, but also affects the electrical and optical properties of the film. The higher the density of the target material, the better the performance of the film. In addition, increasing the density and strength tikslo tikslas leidžia geriau atlaikyti šiluminį įtempį dulkinimo metu . tankis taip pat yra vienas iš pagrindinių tikslinės medžiagos . našumo indeksų